Invention Grant
- Patent Title: Control device and control method of semiconductor manufacturing apparatus
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Application No.: US15252894Application Date: 2016-08-31
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Publication No.: US10553507B2Publication Date: 2020-02-04
- Inventor: Syunichi Ono , Tsutomu Miki , Kenichi Otsuka
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP2016-048663 20160311
- Main IPC: H01L21/66
- IPC: H01L21/66 ; H01L21/67 ; H01L21/304
Abstract:
A control device of a semiconductor manufacturing apparatus includes a processor and a memory connected to the processor and storing instructions executable by the processor. The instructions collect a sound of processing a substrate by the semiconductor manufacturing apparatus. The instructions calculate a difference of a power spectrum of the processing sound between a first point of time and a second point of time. The instructions determine a change point of processing of the substrate based on the difference.
Public/Granted literature
- US20170263512A1 CONTROL DEVICE AND CONTROL METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS Public/Granted day:2017-09-14
Information query
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