Invention Grant
- Patent Title: Integrated circuit structures with extended conductive pathways
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Application No.: US16086712Application Date: 2016-04-28
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Publication No.: US10553515B2Publication Date: 2020-02-04
- Inventor: Yen Hsiang Chew
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Patent Capital Group
- International Application: PCT/US2016/029692 WO 20160428
- International Announcement: WO2017/188951 WO 20171102
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/31 ; H01L23/488 ; H01L23/00

Abstract:
Integrated circuit (IC) structures with extended conductive pathways, as well as related structures, devices, and methods, are disclosed herein. For example, in some embodiments, an IC structure may include a die having a device side and an opposing back side; a mold compound disposed at the back side; and a conductive pathway extending into the die from the back side and extending into the mold compound from the back side.
Public/Granted literature
- US20190109063A1 INTEGRATED CIRCUIT STRUCTURES WITH EXTENDED CONDUCTIVE PATHWAYS Public/Granted day:2019-04-11
Information query
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