Invention Grant
- Patent Title: Wafer laminate and method of producing the same
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Application No.: US15728958Application Date: 2017-10-10
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Publication No.: US10553552B2Publication Date: 2020-02-04
- Inventor: Hiroyuki Yasuda , Michihiro Sugo , Hideto Kato
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2016-199819 20161011
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
To provide a wafer laminate which permits easy bonding between a support and a wafer, permits easy delamination of a wafer from a support, enables enhanced productivity of a thin wafer, and is suited to production of a thin wafer, and for a method of producing the wafer laminate.The wafer laminate includes a support, an adhesive layer formed on the support, and a wafer laminated in such a manner that its front surface having a circuit surface faces the adhesive layer. The adhesive layer includes a light-shielding resin layer A and a non-silicone thermoplastic resin-coating resin layer B in this order from the support side. The resin layer A is composed of a resin that contains a repeating unit having a condensed ring, and the resin layer B has a storage elastic modulus E′ at 25° C. of 1 to 500 MPa and a tensile break strength of 5 to 50 MPa.
Public/Granted literature
- US20180102334A1 WAFER LAMINATE AND METHOD OF PRODUCING THE SAME Public/Granted day:2018-04-12
Information query
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