Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US15980661Application Date: 2018-05-15
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Publication No.: US10553734B2Publication Date: 2020-02-04
- Inventor: Teruhiro Kuwajima , Shinichi Watanuki , Futoshi Komatsu , Tomoo Nakayama
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JP2017-127366 20170629
- Main IPC: H01L31/02
- IPC: H01L31/02 ; H01L31/028 ; H01L31/18 ; H01L23/48 ; H01L23/522 ; H01L31/024 ; H01L31/0232 ; H01L31/0352 ; H01L27/12 ; G02B6/122 ; G02F1/025 ; G02B6/43

Abstract:
An improvement is achieved in the reliability of a semiconductor device. Over an insulating layer, an optical waveguide and a p-type semiconductor portion are formed. Over the p-type semiconductor portion, a multi-layer body including an n-type semiconductor portion and a cap layer is formed. Over a first interlayer insulating film covering the optical waveguide, the p-type semiconductor portion, and the multi-layer body, a heater located over the optical waveguide is formed. In the first interlayer insulating film, first and second contact holes are formed. A first contact portion electrically coupled with the p-type semiconductor portion is formed continuously in the first contact hole and over the first interlayer insulating film. A second contact portion electrically coupled with the cap layer is formed continuously in the second contact hole and over the first interlayer insulating film. A wire formed over a second interlayer insulating film is electrically coupled with the heater and the first and second contact portions via plugs embedded in the second interlayer insulating film.
Public/Granted literature
- US20190006535A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-01-03
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