Invention Grant
- Patent Title: Method for producing a polycrystalline ceramic film
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Application No.: US14411861Application Date: 2013-06-18
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Publication No.: US10553780B2Publication Date: 2020-02-04
- Inventor: Matthias Schreiter , Wolfram Wersing
- Applicant: SIEMENS AKTIENGESELLSCHAFT
- Applicant Address: DE München
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DE München
- Agency: Lempia Summerfield Katz LLC
- Priority: DE102012211314 20120629
- International Application: PCT/EP2013/062606 WO 20130618
- International Announcement: WO2014/001146 WO 20140103
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01L41/316 ; C23C14/08 ; C23C14/54 ; H01J37/34 ; C23C14/00 ; C23C14/06 ; H03H9/17

Abstract:
The invention relates to a method for producing a polycrystalline ceramic film on a surface (12) of a substrate (10), in which a particle stream is directed onto the surface (12) and the ceramic film is formed by deposition of the particles onto the surface (12), wherein the particle stream is directed by means of a diaphragm onto the surface (12) along a preferred direction until a first specified layer thickness is reached, the preferred direction and a surface normal of the surface (12) enclosing a specified angle of incidence. According to the invention, the diaphragm is removed from the particle stream after the specified layer thickness has been reached, and additional particles are directed onto the surface (12) until a specified second layer thickness has been reached.
Public/Granted literature
- US20150136586A1 Method for Producing a Polycrystalline Ceramic Film Public/Granted day:2015-05-21
Information query
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