Invention Grant
- Patent Title: Microphone and manufacture thereof
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Application No.: US15934096Application Date: 2018-03-23
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Publication No.: US10555061B2Publication Date: 2020-02-04
- Inventor: Pan Ding , Qiang Wang , Hongjun Yu , Hui Shi
- Applicant: Semiconductor Manufacturing International (Shanghai) Corporation , Semiconductor Manufacturing International (Beijing) Corporation
- Applicant Address: CN CN
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION,SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION,SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
- Current Assignee Address: CN CN
- Agency: Innovation Counsel LLP
- Priority: CN201710180156 20170324
- Main IPC: H04R1/08
- IPC: H04R1/08 ; H04R23/00 ; H04R19/04 ; H04R31/00

Abstract:
A microphone and its manufacturing method, relating to semiconductor techniques. The microphone comprises a capacitor comprising of a back plate and a vibration film plate, with the vibration film plate comprising a plurality of holes. The holes in the vibration film plate provide a ventilation route for pressured air in the microphone, and thus reduce the pressure on the vibration film plate which otherwise is susceptible to damaged under high air pressure. This inventive concept improves a microphone's acoustic tolerance.
Public/Granted literature
- US20180279031A1 MICROPHONE AND MANUFACTURE THEREOF Public/Granted day:2018-09-27
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