Invention Grant
- Patent Title: Method for producing deposition mask, deposition mask, and method for producing organic semiconductor device
-
Application No.: US16315327Application Date: 2017-01-31
-
Publication No.: US10557191B2Publication Date: 2020-02-11
- Inventor: Koshi Nishida , Susumu Sakio , Katsuhiko Kishimoto
- Applicant: Sakai Display Products Corporation
- Applicant Address: JP Osaka
- Assignee: Sakai Display Products Corporation
- Current Assignee: Sakai Display Products Corporation
- Current Assignee Address: JP Osaka
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- International Application: PCT/JP2017/003409 WO 20170131
- International Announcement: WO2018/142464 WO 20180809
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23C14/04 ; H01L51/56

Abstract:
A method for manufacturing a vapor deposition mask (100) including a resin layer (10), and a magnetic metal body (20) formed on the resin layer (10), the method including the steps of: (A) providing a magnetic metal body (20) having at least one first opening (25); (B) providing a substrate (60); (C) forming a resin layer (10) by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate (60), and then performing a heat treatment thereon; (D) securing the resin layer (10) formed on the substrate (60) on the magnetic metal body (20) so as to cover the at least one first opening (25); (E) forming a plurality of second openings (13) in a region of the resin layer (10) that is located in the at least one first opening (25) of the magnetic metal body (20); and (F) after the step (E), removing the substrate (60) from the resin layer (10).
Public/Granted literature
Information query
IPC分类: