- Patent Title: Substrate transporting apparatus, control apparatus for substrate transporting apparatus, displacement compensation method for substrate transporting apparatus, program for implementing method and recording medium that records program
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Application No.: US15933280Application Date: 2018-03-22
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Publication No.: US10557211B2Publication Date: 2020-02-11
- Inventor: Gaku Yamasaki , Hirotaka Ohashi
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Baker Hostetler LLP
- Priority: JP2017-063070 20170328
- Main IPC: C25D17/06
- IPC: C25D17/06 ; B25J5/02 ; B25J11/00 ; B25J9/16 ; H01L21/677 ; H01L21/687 ; C25D21/12 ; B25J9/02 ; C25D17/00 ; H01L21/67 ; C23C18/16

Abstract:
In assembly of a conventional plating apparatus, a position of a processing tank is adjusted so that the processing tank is disposed at an ideal position. This adjustment takes time and effort to assemble a plating apparatus, and assembly of the plating apparatus requires a high cost. The invention provides a substrate transporting apparatus provided with a substrate holder for holding a substrate, a holder griping mechanism that grips the substrate holder, a substrate transporting section that transports the substrate holder, a rotation mechanism that rotationally moves the holder griping mechanism around a vertical direction as an axis, and a linear motion mechanism that linearly moves the holder griping mechanism in a direction perpendicular to a plane defined by a transporting direction of the substrate holder by the substrate transporting section and a vertical direction.
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