Control device, lithography apparatus, and method of manufacturing article
Abstract:
The present invention provides a control device that performs position control of a control target by giving a feedforward manipulated value to the control target, wherein the device obtains, for each of a plurality of positions at which the control target is to be arranged, a measurement result of a first output response of the control target obtained when giving a first manipulated value to the control target, determines a reference value of the first output response, based on the measurement results respectively obtained at the plurality of positions, determines a second manipulated value by arraying a plurality of first manipulated values in time-series based on a relationship between the first manipulated value and the reference value, and sets the feedforward manipulated value based on the second manipulated value.
Information query
Patent Agency Ranking
0/0