Invention Grant
- Patent Title: Mask assembly
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Application No.: US15526654Application Date: 2015-11-16
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Publication No.: US10558129B2Publication Date: 2020-02-11
- Inventor: Matthias Kruizinga , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Erik Willem Bogaart , Derk Servatius Gertruda Brouns , Marc Bruijn , Richard Joseph Bruls , Jeroen Dekkers , Paul Janssen , Mohammad Reza Kamali , Ronald Harm Gunther Kramer , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Matthew Lipson , Erik Roelof Loopstra , Joseph H. Lyons , Stephen Roux , Gerrit Van Den Bosch , Sander Van Den Heijkant , Sandra Van Der Graaf , Frits Van Der Meulen , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2015/076687 WO 20151116
- International Announcement: WO2016/079051 WO 20160526
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/64 ; G03F1/22
Abstract:
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Public/Granted literature
- US20180329314A1 Mask Assembly Public/Granted day:2018-11-15
Information query
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