Invention Grant
- Patent Title: Parallax minimization stitching method and apparatus using control points in overlapping region
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Application No.: US15662616Application Date: 2017-07-28
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Publication No.: US10558881B2Publication Date: 2020-02-11
- Inventor: Yong Ju Cho , Soon-heung Jung , Hyun Cheol Kim , Jeongil Seo , Joo Myoung Seok , Sangwoo Ahn , Seung Jun Yang , Injae Lee , Hee Kyung Lee , Seong Yong Lim
- Applicant: Electronics and Telecommunications Research Institute
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Agency: William Park & Associates, Ltd.
- Priority: KR10-2016-0107905 20160824; KR10-2017-0036889 20170323
- Main IPC: G06K9/36
- IPC: G06K9/36 ; G06K9/20 ; H04N9/097 ; G06T3/00 ; H04N13/225 ; G06K9/00 ; H04N5/262 ; H04N5/232 ; G06T3/40 ; H04N13/239 ; H04N13/00

Abstract:
Provided is a parallax minimization stitching method and apparatus using control points in an overlapping region. A parallax minimization stitching method may include defining a plurality of control points in an overlapping region of a first image and a second image received from a plurality of cameras, performing a first geometric correction by applying a homography to the control points, defining a plurality of patches based on the control points, and performing a second geometric correction by mapping the patches.
Public/Granted literature
- US20180060682A1 PARALLAX MINIMIZATION STITCHING METHOD AND APPARATUS USING CONTROL POINTS IN OVERLAPPING REGION Public/Granted day:2018-03-01
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