Invention Grant
- Patent Title: Apparatus with concentric pumping for multiple pressure regimes
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Application No.: US15433008Application Date: 2017-02-15
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Publication No.: US10559451B2Publication Date: 2020-02-11
- Inventor: Nikolai Nikolaevich Kalnin , Toan Q. Tran , Dmitry Lubomirsky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/44 ; C23C16/455 ; H01L21/67 ; F16K5/12 ; F16K51/02 ; C23C16/50 ; B01F15/02 ; C23C16/52 ; F04D27/00

Abstract:
An exhaust module for a substrate processing apparatus having a body, a pumping ring, and a symmetric flow valve, is disclosed herein. The body has a first and second vacuum pump opening formed therethrough. The pumping ring is positioned in the body over both the first and second vacuum pump openings. The pumping ring includes a substantially ring shaped body having a top surface, a bottom surface, and an opening. The top surface has one or more through holes formed therein, arranged in a pattern concentric with the first vacuum pump opening. The bottom surface has a fluid passage formed therein, interconnecting each of the one or more through holes. The opening is formed in the substantially ring shaped body, substantially aligned with the vacuum pump opening. The symmetric flow valve is positioned in the body over the pumping ring and movable between a raised position and a lowered position.
Public/Granted literature
- US20180233327A1 APPARATUS WITH CONCENTRIC PUMPING FOR MULTIPLE PRESSURE REGIMES Public/Granted day:2018-08-16
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