Invention Grant
- Patent Title: Method for manufacturing photoelectric conversion device
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Application No.: US15584748Application Date: 2017-05-02
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Publication No.: US10559464B2Publication Date: 2020-02-11
- Inventor: Hideshi Kuwabara , Nobutaka Ukigaya
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A. Inc., IP Division
- Priority: JP2016-094171 20160509
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L31/18 ; H01L31/0264 ; H01L31/04 ; H01L31/20

Abstract:
A method for manufacturing a photoelectric conversion device comprising the steps of fixing a first substrate including a semiconductor layer provided with a photoelectric conversion element, to a second substrate, thinning the first substrate fixed to the second substrate, from the opposite side of the first substrate from the second substrate, fixing the first substrate to a third substrate provided with a semiconductor element such that the third substrate is located on the opposite side of the first substrate from the second substrate, and removing the second substrate after the step of fixing the first substrate to the third substrate.
Public/Granted literature
- US20170323787A1 METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE Public/Granted day:2017-11-09
Information query
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