Invention Grant
- Patent Title: Semiconductor electrostatic discharge protection device
-
Application No.: US16229802Application Date: 2018-12-21
-
Publication No.: US10559560B2Publication Date: 2020-02-11
- Inventor: Fang-Wen Liu , Tseng-Fu Lu , Wei-Ming Liao
- Applicant: Nanya Technology Corporation
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L49/02

Abstract:
The present disclosure provides a semiconductor ESD protection device. The semiconductor ESD protection device includes a substrate including a first conductivity type, a gate formed on the substrate, a source region and a drain region formed in the substrate, and a body region formed in the substrate. The substrate and the body region include a first conductivity type. The source region and the drain region include a second conductivity type. And the first conductivity type and the second conductivity type are complementary to each other. The body region is electrically connected to the gate.
Public/Granted literature
- US20190131294A1 SEMICONDUCTOR ELECTROSTATIC DISCHARGE PROTECTION DEVICE Public/Granted day:2019-05-02
Information query
IPC分类: