Invention Grant
- Patent Title: Semiconductor device with improved current flow distribution
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Application No.: US15782887Application Date: 2017-10-13
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Publication No.: US10559663B2Publication Date: 2020-02-11
- Inventor: Tatsuya Naito
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JP2016-203146 20161014; JP2017-091414 20170501
- Main IPC: H01L27/07
- IPC: H01L27/07 ; H01L29/06 ; H01L29/08 ; H01L29/10 ; H01L29/32 ; H01L29/40 ; H01L29/423 ; H01L29/739 ; H01L29/861

Abstract:
A semiconductor device is provided, including: a semiconductor substrate; a transistor section provided in the semiconductor substrate; and a diode section provided in the semiconductor substrate being adjacent to the transistor section, wherein the diode section includes: a second conductivity-type anode region; a first conductivity-type drift region; a first conductivity-type cathode region; a plurality of dummy trench portions arrayed along a predetermined array direction; a contact portion provided along an extending direction of the plurality of dummy trench portions that is different from the array direction; and a lower-surface side semiconductor region provided directly below a portion of the contact portion at an outer end in the extending direction.
Public/Granted literature
- US20180108737A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-04-19
Information query
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