Invention Grant
- Patent Title: Field-effect transistor
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Application No.: US16410282Application Date: 2019-05-13
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Publication No.: US10559665B2Publication Date: 2020-02-11
- Inventor: Jinqiao Xie , Edward A. Beam, III
- Applicant: Qorvo US, Inc.
- Applicant Address: US NC Greensboro
- Assignee: Qorvo US, Inc.
- Current Assignee: Qorvo US, Inc.
- Current Assignee Address: US NC Greensboro
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/20 ; H01L29/66 ; H01L29/78

Abstract:
A field-effect transistor having a transconductance (gm) that remains within 65% of a maximum gm value over at least 85% of a gate voltage range that transitions the field-effect transistor between an on-state that allows substantial current flow through the channel layer and an off-state that prevents substantial current flow through the channel layer is disclosed. The field-effect transistor includes a substrate and a channel layer having a proximal boundary relative to the substrate and a distal boundary relative to the substrate. The channel layer is disposed over the substrate and comprises a compound semiconductor material that includes at least one element having a concentration that is graded between the proximal boundary and the distal boundary.
Public/Granted literature
- US20190267452A1 FIELD-EFFECT TRANSISTOR Public/Granted day:2019-08-29
Information query
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