Invention Grant
- Patent Title: Avalanche photodiode type structure and method of fabricating such a structure
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Application No.: US15643930Application Date: 2017-07-07
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Publication No.: US10559706B2Publication Date: 2020-02-11
- Inventor: Johan Rothman
- Applicant: COMMISSARIAT A L 'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: COMMISSARIAT A L'ENERGIE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT A L'ENERGIE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1656581 20160708
- Main IPC: H01L31/107
- IPC: H01L31/107 ; H01L31/0296 ; H01L31/0304 ; H01L31/18

Abstract:
A structure of the avalanche photodiode type includes a first P doped semiconducting zone, a second multiplication semiconducting zone adapted to supply a multiplication that is preponderant for electrons, a fourth P doped semiconducting “collection” zone. One of the first and second semiconducting zones forms the absorption zone. The structure also includes a third semiconducting zone formed between the second semiconducting zone and the fourth semiconducting zone. The third semiconducting zone has an electric field in operation capable of supplying an acceleration of electrons between the second semiconducting zone and the fourth semiconducting zone without multiplication of carriers by impact ionisation.
Public/Granted literature
- US20180013030A1 AVALANCHE PHOTODIODE TYPE STRUCTURE AND METHOD OF FABRICATING SUCH A STRUCTURE Public/Granted day:2018-01-11
Information query
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