Invention Grant
- Patent Title: Tunnel magnetic resistance element and method for manufacturing same
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Application No.: US16077601Application Date: 2017-02-16
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Publication No.: US10559748B2Publication Date: 2020-02-11
- Inventor: Yasuo Ando , Mikihiko Oogane , Kosuke Fujiwara , Junichi Jono
- Applicant: TOHOKU UNIVERSITY , Konica Minolta, Inc.
- Applicant Address: JP Miyagi JP Tokyo
- Assignee: TOHOKU UNIVERSITY,KONICA MINOLTA, INC.
- Current Assignee: TOHOKU UNIVERSITY,KONICA MINOLTA, INC.
- Current Assignee Address: JP Miyagi JP Tokyo
- Agency: Lucas & Mercanti, LLP
- Priority: JP2016-029566 20160219
- International Application: PCT/JP2017/005608 WO 20170216
- International Announcement: WO2017/141999 WO 20170824
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01L43/08 ; H01L43/12 ; H01F41/30 ; G01R33/09 ; H01F10/32 ; H01F10/13 ; H01L43/02

Abstract:
A tunnel magnetic resistance element includes the following, a fixed magnetic layer with a fixed direction of magnetization, a free magnetic layer in which the direction of magnetization changes, and an insulating layer which is positioned between the fixed magnetic layer and the free magnetic layer. The fixed magnetic layer, the free magnetic layer, and the insulating layer form a magnetic tunnel junction. A resistance of the insulating layer changes by a tunnel effect according to a difference in an angle between the direction of magnetization of the fixed magnetic layer and the direction of magnetization of the free magnetic layer. The free magnetic layer includes a ferromagnetic layer, a soft magnetic layer, and a magnetic bonding layer placed in between. Material of the magnetic bonding layer include Ru or Ta, and a layer thickness is 1.0 nm to 1.3 nm.
Public/Granted literature
- US20190044058A1 TUNNEL MAGNETIC RESISTANCE ELEMENT AND METHOD FOR MANUFACTURING SAME Public/Granted day:2019-02-07
Information query
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