Invention Grant
- Patent Title: Wafer chuck with aerodynamic design for turbulence reduction
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Application No.: US15647183Application Date: 2017-07-11
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Publication No.: US10563298B1Publication Date: 2020-02-18
- Inventor: Craig P. Stephens , Matt Kanetomi , Joseph Richardson , Chris Veazey , Aaron LaBrie
- Applicant: Novellus Systems, Inc.
- Applicant Address: US CA Fremont
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sa,pson LLP
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/687 ; C23C14/50 ; C23C16/458
Abstract:
A rotatable wafer chuck includes chuck arms and wafer holders that are aerodynamically shaped to reduce turbulence during rotation. A wafer holder may include a friction support and an independently rotatable vertical alignment member and clamping member that is shaped to reduce drag. The shape reduces turbulence during edge bevel etching to improve the uniformity of the edge exclusion and during high-speed rotation to improve particle performance.
Information query
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