Invention Grant
- Patent Title: Prober and prober operation method
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Application No.: US16141596Application Date: 2018-09-25
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Publication No.: US10564185B2Publication Date: 2020-02-18
- Inventor: Toshiro Mori , Tomoya Nishida
- Applicant: Tokyo Seimitsu Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Tokyo Seimitsu Co., Ltd.
- Current Assignee: Tokyo Seimitsu Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Morgan, Lewis & Bockius LLP
- Priority: JP2016-063845 20160328; JP2016-063846 20160328
- Main IPC: G01R1/067
- IPC: G01R1/067 ; G01R1/073 ; G01R31/28

Abstract:
A prober for preventing a collision between a probe and a probe position detecting camera and a prober operation method are provided. A prober that performs an inspection by bringing a probe into contact with an electrode of a wafer W includes: a probe position detecting camera for detecting the position of the tip of the probe to perform relative positional alignment between the electrode of the wafer W and the probe; a probe height detector, provided separately from the probe position detecting camera, for detecting the height of the tip of the probe from a reference plane serving as a reference for the height of the probe position detecting camera; and a first height adjusting mechanism for changing the height of the probe position detecting camera from the reference plane, based on the detection result of the probe height detector.
Public/Granted literature
- US20190025342A1 PROBER AND PROBER OPERATION METHOD Public/Granted day:2019-01-24
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