Invention Grant
- Patent Title: Antireflection film and method of producing the same, and optical member
-
Application No.: US15679557Application Date: 2017-08-17
-
Publication No.: US10564323B2Publication Date: 2020-02-18
- Inventor: Tatsuya Yoshihiro , Tadashi Kasamatsu , Shinichiro Sonoda
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-038975 20150227; JP2015-170534 20150831
- Main IPC: G02B1/11
- IPC: G02B1/11 ; G02B1/115 ; B32B7/02 ; B32B15/20 ; B32B3/30 ; G02B1/118

Abstract:
An antireflection film includes an uneven structure layer that has an uneven structure and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 8.5 μm−1 or greater and has a film thickness of 200-250 nm, and the intermediate layer comprises a plurality of layers including at least a first layer, a second layer, a third layer, and a fourth layer.
Public/Granted literature
- US20170343705A1 ANTIREFLECTION FILM AND METHOD OF PRODUCING THE SAME, AND OPTICAL MEMBER Public/Granted day:2017-11-30
Information query