Invention Grant
- Patent Title: Method of using equipment method and system for manufacturing mask or display substrate
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Application No.: US15560086Application Date: 2017-03-09
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Publication No.: US10564540B2Publication Date: 2020-02-18
- Inventor: Zhiming Lin , Zhen Wang , Jian Zhang , Chun Chieh Huang
- Applicant: BOE Technology Group Co., Ltd. , Ordos Yuansheng Optoelectronics Co., Ltd.
- Applicant Address: CN Beijing CN Ordos, Inner Mongolia
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Beijing CN Ordos, Inner Mongolia
- Agency: Westman, Champlin & Koehler, P.A.
- Priority: CN201610929809 20161031
- International Application: PCT/CN2017/076087 WO 20170309
- International Announcement: WO2018/076591 WO 20180503
- Main IPC: G03F1/74
- IPC: G03F1/74 ; G03F1/72 ; G03F7/20 ; G03F1/44 ; H01L21/68 ; G02F1/13

Abstract:
The present disclosure relates to a method of using an equipment for manufacturing or using a mask or a display substrate; and the method includes: providing a master plate; setting, on the master plate, a plurality of measuring points corresponding to positions of the mask or the display substrate where a pixel position accuracy measurement is to be implemented, according to the mask or the display substrate to be measured; and placing the master plate in a coordinate system of the equipment, and measuring error values between the equipment and the master plate at the measuring points.
Public/Granted literature
- US20180307134A1 Method Of Using Equipment Method And System For Manufacturing Mask Or Display Substrate Public/Granted day:2018-10-25
Information query
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