Invention Grant
- Patent Title: Method for determining a focus position of a lithography mask and metrology system for carrying out such a method
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Application No.: US16280521Application Date: 2019-02-20
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Publication No.: US10564551B2Publication Date: 2020-02-18
- Inventor: Markus Koch , Dirk Hellweg , Renzo Capelli , Martin Dietzel
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102018202637 20180221
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; G03F1/00
Abstract:
For determining a focus position of a lithography mask (e.g., 5), a focus stack of a measurement region free of structures to be imaged is recorded and the speckle patterns of the recorded images are evaluated.
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