Invention Grant
- Patent Title: Method and apparatus for modeling based on particles for efficient constraints processing
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Application No.: US15187135Application Date: 2016-06-20
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Publication No.: US10565328B2Publication Date: 2020-02-18
- Inventor: Nahyup Kang , Jiyeon Kim , Donghoon Sagong , Hyong Euk Lee , Hwiryong Jung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2015-0102235 20150720
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F7/02 ; G06T17/00 ; G06T19/20

Abstract:
A modeling method based on particles, the method including generating coarse particles by down-sampling target particles corresponding to at least a portion of a target object, calculating a correcting value enabling the coarse particles to satisfy constraints of the target object based on physical attributes of the target particles, applying the correcting value to the target particles, and redefining the target particles in response to the target particles to which the correcting value is applied satisfying the constraints.
Public/Granted literature
- US20170024498A1 METHOD AND APPARATUS FOR MODELING BASED ON PARTICLES FOR EFFICIENT CONSTRAINTS PROCESSING Public/Granted day:2017-01-26
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