Invention Grant
- Patent Title: Focus ring and plasma processing apparatus
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Application No.: US15945456Application Date: 2018-04-04
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Publication No.: US10566175B2Publication Date: 2020-02-18
- Inventor: Nobuyuki Nagayama , Naoyuki Satoh , Masahiko Oka , Yasuyuki Matsuoka
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2013-222563 20131025
- Main IPC: C08L27/16
- IPC: C08L27/16 ; H01J37/32

Abstract:
A focus ring to be detachably attached to a top surface of an outer peripheral portion of a mounting table in a processing chamber, includes: an annular main body having a back surface to be attached to the top surface of the outer peripheral portion of the mounting table. And a thermally conductive sheet fixed to the annular main body, the thermally conductive sheet being interposed between the annular main body and the top surface of the outer peripheral portion of the mounting. The thermally conductive sheet is fixed as one unit to the annular main body by coating an unvulcanized rubber on one surface of the thermally conductive sheet, bringing said one surface into contact with the annular main body, and heating the thermally conductive sheet and the annular main body to vulcanize and to adhere the thermally conductive sheet to the annular main body.
Public/Granted literature
- US20180240651A1 FOCUS RING AND PLASMA PROCESSING APPARATUS Public/Granted day:2018-08-23
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