Invention Grant
- Patent Title: Drying apparatus
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Application No.: US16015162Application Date: 2018-06-21
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Publication No.: US10566217B2Publication Date: 2020-02-18
- Inventor: Chih-Chieh Liao , Yu-Min Sun , Chih-Feng Cheng
- Applicant: GLOBAL UNICHIP CORPORATION , TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu TW Hsinchu
- Assignee: GLOBAL UNICHIP CORPORATION,TAIWAN SEMICONDUCTOR MANUFACTORING CO., LTD.
- Current Assignee: GLOBAL UNICHIP CORPORATION,TAIWAN SEMICONDUCTOR MANUFACTORING CO., LTD.
- Current Assignee Address: TW Hsinchu TW Hsinchu
- Agency: CKC & Partners Co., LLC
- Priority: CN201810256039 20180327
- Main IPC: F26B3/34
- IPC: F26B3/34 ; H01L21/67 ; F26B5/04 ; F26B5/00 ; F26B3/04

Abstract:
A drying apparatus includes an oven body, a magnetic field generating device, a chamber pressure controlling device and a baking device. The oven body is provided with a chamber which is air-hermetic for receiving a semiconductor package element. The chamber pressure controlling device reduces a chamber pressure of the chamber. The magnetic field generating device polarizes liquid on the semiconductor package element in the chamber. The baking device evaporates the liquid on the semiconductor package in the chamber.
Public/Granted literature
- US20190304810A1 DRYING APPARATUS Public/Granted day:2019-10-03
Information query
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