Invention Grant
- Patent Title: Storage element and memory
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Application No.: US16150874Application Date: 2018-10-03
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Publication No.: US10566523B2Publication Date: 2020-02-18
- Inventor: Yutaka Higo , Masanori Hosomi , Kazuhiro Bessho , Tetsuya Yamamoto , Hiroyuki Ohmori , Kazutaka Yamane , Yuki Oishi , Hiroshi Kano
- Applicant: Sony Corporation
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2005-348112 20051201
- Main IPC: H01L21/82
- IPC: H01L21/82 ; H01L43/10 ; B82Y10/00 ; B82Y25/00 ; H01L27/22 ; H01L43/08 ; H01L43/02

Abstract:
A storage element including a storage layer configured to hold information by use of a magnetization state of a magnetic material, with a pinned magnetization layer being provided on one side of the storage layer, with a tunnel insulation layer, and with the direction of magnetization of the storage layer being changed through injection of spin polarized electrons by passing a current in the lamination direction, so as to record information in the storage layer, wherein a spin barrier layer configured to restrain diffusion of the spin polarized electrons is provided on the side, opposite to the pinned magnetization layer, of the storage layer; and the spin barrier layer includes at least one material selected from the group composing of oxides, nitrides, and fluorides.
Public/Granted literature
- US20190036019A1 STORAGE ELEMENT AND MEMORY Public/Granted day:2019-01-31
Information query
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