Invention Grant
- Patent Title: Ordered nanoscale domains by infiltration of block copolymers
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Application No.: US15332335Application Date: 2016-10-24
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Publication No.: US10577466B2Publication Date: 2020-03-03
- Inventor: Seth B. Darling , Jeffrey W. Elam , Yu-Chih Tseng , Qing Peng
- Applicant: UChicago Argonne, LLC
- Applicant Address: US IL Chicago
- Assignee: UChicago Argonne, LLC
- Current Assignee: UChicago Argonne, LLC
- Current Assignee Address: US IL Chicago
- Agency: Foley & Lardner LLP
- Main IPC: C08F8/42
- IPC: C08F8/42 ; C08G83/00 ; H01L21/027 ; H01G9/02 ; H01J9/02 ; H01L51/42 ; H01L51/44 ; H01M2/16 ; H01M10/0565

Abstract:
A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.
Public/Granted literature
- US20170137577A1 ORDERED NANOSCALE DOMAINS BY INFILTRATION OF BLOCK COPOLYMERS Public/Granted day:2017-05-18
Information query
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