Implementations described herein generally relate method for detecting excursions in time-series traces received from sensors of manufacturing tools. A server extracts one or more time series traces and metrology data collected from one or more sensors associated with one or more manufacturing tools configured to produce a silicon substrate. The server identifies one or more candidate excursions of the one or more time series traces by comparing the one or more time series traces to one or more traces associated with a working reference sensor. The server verifies that a candidate excursion of the one or more candidate excursions is a true excursion based on correlating the one or more time series traces to the metrology data. The server instructs a manufacturing system to take corrective action to remove the selected true excursion.