Invention Grant
- Patent Title: Defect rate analytics to reduce defectiveness in manufacturing
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Application No.: US16025865Application Date: 2018-07-02
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Publication No.: US10579042B2Publication Date: 2020-03-03
- Inventor: Qiyao Wang , Susumu Serita , Chetan Gupta
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Procopio, Cory, Hargreaves & Savitch LLP
- Main IPC: G05B19/406
- IPC: G05B19/406

Abstract:
Example implementations described herein are directed to systems and methods for defect rate analytics to reduce defectiveness in manufacturing. In an example implementation, a method include determining, from data associated with each feature for a manufacturing process, the data feature indicative of process defects detected based on the feature, an estimated condition for the feature that reduces a defect rate of the process defects, the estimated condition indicating the data into a first group and second group; calculating the rate reduction of the defect rate based on a difference in defects between the first group and the second group; for the rate reduction meeting a target confidence level for a target defect rate, applying the estimated condition to the manufacturing process associated with each of the features. In example implementations, the defect rate analytics reduce defectiveness in manufacturing with independent processes and/or dependent processes.
Public/Granted literature
- US20200004219A1 DEFECT RATE ANALYTICS TO REDUCE DEFECTIVENESS IN MANUFACTURING Public/Granted day:2020-01-02
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