Invention Grant
- Patent Title: Beam delivery apparatus and method
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Application No.: US14917623Application Date: 2014-09-24
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Publication No.: US10580545B2Publication Date: 2020-03-03
- Inventor: Vadim Yevgenyevich Banine , Petrus Rutgerus Bartraij , Ramon Pascal Van Gorkom , Lucas Johannes Peter Ament , Pieter Willem Herman De Jager , Gosse Charles De Vries , Rilpho Ludovicus Donker , Wouter Joep Engelen , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Erik Roelof Loopstra , Han-Kwang Nienhuys , Andrey Alexandrovich Nikipelov , Michael Jozef Mathijs Renkens , Franciscus Johannes Joseph Janssen , Borgert Kruizinga
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP13199009 20131220; EP14151497 20140116; EP14152443 20140124; EP14155980 20140220; EP14165675 20140423; EP14171050 20140604; EP14171051 20140604; EP14172951 20140618; EP14173446 20140623
- International Application: PCT/EP2014/070335 WO 20140924
- International Announcement: WO2015/044182 WO 20150402
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G21K1/06
Abstract:
A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Public/Granted literature
- US20160225477A1 BEAM DELIVERY APPARATUS AND METHOD Public/Granted day:2016-08-04
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