Invention Grant
- Patent Title: Transient voltage suppressor
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Application No.: US16191507Application Date: 2018-11-15
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Publication No.: US10580764B2Publication Date: 2020-03-03
- Inventor: Chih-Hao Chen
- Applicant: uPI semiconductor corporation
- Applicant Address: TW Zhubei, Hsinchu County
- Assignee: UPI SEMICONDUCTOR CORP.
- Current Assignee: UPI SEMICONDUCTOR CORP.
- Current Assignee Address: TW Zhubei, Hsinchu County
- Agency: McClure, Qualey & Rodack, LLP
- Priority: TW106141032A 20171124
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/06 ; H01L29/87

Abstract:
A transient voltage suppressor includes a substrate, a first well, a second well, a first electrode, a second electrode, a doped region and a heavily-doped region. The first well is formed in the substrate and near a surface of substrate. The second well is formed in the first well and near the surface. The first electrode and second electrode are formed in the second well and near the surface respectively. The first well and first electrode have a first electrical property. The second well and second electrode have a second electrical property. The doped region is formed between the first electrode and second electrode and near the surface and electrically connected with the first well and second well. The heavily-doped region is formed under the doped region. The heavily-doped region has the same electrical property with the doped region and has higher doping concentration than the doped region.
Public/Granted literature
- US20190164951A1 TRANSIENT VOLTAGE SUPPRESSOR Public/Granted day:2019-05-30
Information query
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