Invention Grant
- Patent Title: Flux
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Application No.: US15999473Application Date: 2017-02-16
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Publication No.: US10583533B2Publication Date: 2020-03-10
- Inventor: Daisuke Maruko , Atsumi Takahashi , Hiroyoshi Kawasaki
- Applicant: Senju Metal Industry Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Senju Metal Industry Co., Ltd.
- Current Assignee: Senju Metal Industry Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: WOPCT/JP2016/054737 20160218
- International Application: PCT/JP2017/005713 WO 20170216
- International Announcement: WO2017/142020 WO 20170824
- Main IPC: B23K35/362
- IPC: B23K35/362 ; C08G65/333 ; C08K5/17 ; C08K5/09 ; B23K35/36 ; B23K101/36

Abstract:
Provided is a flux that is able to suppress any solder bridges even when it is applied to the narrow pitched electrodes such that the bridge occurs when using the past flux. The flux is characterized by containing 15% by mass or more and 35% by mass or less of polyoxyalkylene ethylenediamine, 2% by mass or more and 15% by mass or less of an organic acid, 10% by mass or more and 30% by mass or less of a base material, 3% by mass or more and 30% by mass or less of an amine and 20% by mass or more and 40% by mass or less of a solvent.
Public/Granted literature
- US20190210167A1 Flux Public/Granted day:2019-07-11
Information query
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