Invention Grant
- Patent Title: Method of manufacturing a screen provided with retroreflective microstructures
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Application No.: US15404684Application Date: 2017-01-12
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Publication No.: US10583585B2Publication Date: 2020-03-10
- Inventor: Christophe Martinez , Bernard Aventurier
- Applicant: Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- Applicant Address: FR Paris
- Assignee: Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- Current Assignee: Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- Current Assignee Address: FR Paris
- Agency: Wolf, Greenfield & Sacks, P.C.
- Priority: FR1650226 20160112
- Main IPC: B29C33/42
- IPC: B29C33/42 ; B29D11/00 ; G02B5/124 ; B29L31/30 ; B29L31/34

Abstract:
A method of manufacturing a primary mold for the forming of a retroreflective screen, the method including the steps of: a) forming, on the front surface of such a substrate, a layer of a material such that the first substrate is selectively etchable over said layer; and b) forming microrecesses from the rear surface of the first substrate by selective etching of the first substrate over said layer, each microrecess emerging on the rear surface of said layer and having a back parallel to the front surface of the first substrate and first and second lateral walls orthogonal to each other and orthogonal to the back the first and second lateral walls and the back of the microrecess joining at a same point and forming a trihedron.
Public/Granted literature
- US20170197338A1 METHOD OF MANUFACTURING A SCREEN PROVIDED WITH RETROREFLECTIVE MICROSTRUCTURES Public/Granted day:2017-07-13
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