Invention Grant
- Patent Title: Method for producing a pattern in or on a support
-
Application No.: US15740671Application Date: 2016-07-11
-
Publication No.: US10583618B2Publication Date: 2020-03-10
- Inventor: Brian William Holmes
- Applicant: DE LA RUE INTERNATIONAL LIMITED
- Applicant Address: GB Basingstoke
- Assignee: DE LA RUE INTERNATIONAL LIMITED
- Current Assignee: DE LA RUE INTERNATIONAL LIMITED
- Current Assignee Address: GB Basingstoke
- Agency: Oliff PLC
- Priority: GB1512121.3 20150710
- International Application: PCT/GB2016/052089 WO 20160711
- International Announcement: WO2017/009624 WO 20170119
- Main IPC: B29D11/00
- IPC: B29D11/00 ; B44C1/17 ; B41M3/14 ; B42D25/324 ; B01D24/48 ; B01D35/12 ; B01D24/12 ; B01D24/46 ; B42D25/23 ; B42D25/24 ; B42D25/29

Abstract:
A method of applying a pattern formed of two different materials to a pattern support layer includes: providing a die form having a surface with recesses defining the pattern; applying a first curable material to a surface first region, received in some of the first region recesses and partially filling a first region recess set; applying a second curable material to some of the surface first region, the second curable material at least partially fills the first set of the first region recesses; contacting a pattern support layer with the die form surface to cover the recesses containing both the first and second curable materials; separating the pattern support layer from the die form surface, the first and second curable materials in the covered recesses removed therefrom and retained on the pattern support layer; and curing the first and second curable materials during and/or after the second and third steps.
Public/Granted literature
- US20180194090A1 A METHOD FOR PRODUCING A PATTERN IN OR ON A SUPPORT Public/Granted day:2018-07-12
Information query