Invention Grant
- Patent Title: Photosensitive polyimide resin composition and method of manufacturing cover film using the same
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Application No.: US16519934Application Date: 2019-07-23
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Publication No.: US10584209B2Publication Date: 2020-03-10
- Inventor: Tang-Chieh Huang , Kunhan Hsieh
- Applicant: Microcosm Technology CO. LTD
- Applicant Address: TW Tainan
- Assignee: Microcosm Technology Co., Ltd.
- Current Assignee: Microcosm Technology Co., Ltd.
- Current Assignee Address: TW Tainan
- Agency: Haverstock & Owens LLP
- Priority: TW106118252A 20170602
- Main IPC: C08G73/10
- IPC: C08G73/10 ; C08G59/02 ; C08L79/08 ; C09B57/10 ; C09B69/10 ; G03F7/038 ; G03F7/16 ; G03F7/40 ; G03F7/075

Abstract:
A photosensitive polyimide resin composition is provided. The resin composition comprises an infrared absorber, an epoxy, a photosensitive polyimide and a photo initiator. The infrared absorber includes pigment and has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The epoxy has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The photosensitive polyimide has the structure of formula (1): wherein m, n are independently 1 to 600; X is a tetravalent organic group, and the main chain of X includes alicyclic structure; Y is a divalent organic group, and the main chain of Y includes siloxane structure; Z is a divalent organic group, and the side chain of Z includes phenolic hydroxyl group or carboxyl group. The photosensitive polyimide has an amount of weight accounting for 30-90% of total solid weight of the photosensitive polyimide resin composition. The photo initiator has an amount of weight accounting for 0.1-15% of total solid weight of the transparent photosensitive resin.
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