Invention Grant
- Patent Title: Vertical system with vacuum pre-loaded deposition head
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Application No.: US15458335Application Date: 2017-03-14
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Publication No.: US10584413B2Publication Date: 2020-03-10
- Inventor: Todd Mathew Spath , Carolyn Rae Ellinger
- Applicant: Eastman Kodak Company
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent Kevin E. Spaulding
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/44

Abstract:
A thin film deposition system includes a vacuum-preloaded gas bearing deposition head positioned in an external environment. The deposition head has a vertically-oriented output face including a plurality of source openings through which gaseous materials are supplied and one or more exhaust openings. An exhaust pressure at the exhaust openings is less than an ambient pressure, and a source pressure at the source openings is greater than the exhaust pressure, with the pressure at the outermost source openings being greater than the ambient pressure. A substrate positioner applies a vertical force onto a substrate unit, the vertical force passing through a center of gravity of the substrate unit. A motion control system moves the substrate positioner, thereby moving the substrate unit relative to the output face in an in-track direction without constraining the motion of the substrate unit in a direction normal to the output face of the deposition head.
Public/Granted literature
- US20180265971A1 VERTICAL SYSTEM WITH VACUUM PRE-LOADED DEPOSITION HEAD Public/Granted day:2018-09-20
Information query
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