Invention Grant
- Patent Title: Electrochemical etching apparatus
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Application No.: US15449354Application Date: 2017-03-03
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Publication No.: US10584425B2Publication Date: 2020-03-10
- Inventor: Lian Guo , Shu-Jen Han , Xuesong Li
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: C25F7/00
- IPC: C25F7/00 ; C25D17/00 ; C25F3/02 ; C25F5/00 ; B32B38/10 ; C01B32/21 ; C01B32/184 ; C01B32/20 ; C01B32/186

Abstract:
An electroplating etching apparatus includes a power to output current, and a container configured to contain an electrolyte. A cathode is coupled to the container and configured to fluidly communicate with the electrolyte. An anode is electrically connected to the output, and includes a graphene layer. A metal substrate layer is formed on the graphene layer, and is etched from the graphene layer in response to the current flowing through the anode.
Public/Granted literature
- US20170175288A1 ELECTROCHEMICAL ETCHING APPARATUS Public/Granted day:2017-06-22
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