Invention Grant
- Patent Title: Process-induced excursion characterization
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Application No.: US16273876Application Date: 2019-02-12
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Publication No.: US10585049B2Publication Date: 2020-03-10
- Inventor: Helen (Heng) Liu , Aye Aung , GuoQing Zhang
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01N21/956 ; H01L23/498 ; G06F17/50

Abstract:
A system includes a controller with one or more processors and memory configured to store one or more sets of program instructions. The one or more processors are configured to execute the one or more sets of program instructions. The one or more sets of program instructions are configured to cause the one or more processors to apply filtering to a semiconductor wafer map; separate the filtered semiconductor wafer map into a plurality of dies; generate a set of die comparison statistics for the plurality of dies; generate at least one excursion map by applying at least one inspection threshold to the set of die comparison statistics; and detect at least one excursion within the at least one excursion map.
Public/Granted literature
- US20190277777A1 Process-Induced Excursion Characterization Public/Granted day:2019-09-12
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