Invention Grant
- Patent Title: Projection optical system, projection apparatus, and projection system
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Application No.: US16270164Application Date: 2019-02-07
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Publication No.: US10585269B2Publication Date: 2020-03-10
- Inventor: Yohei Takano , Hibiki Tatsuno , Yasuyuki Shibayama
- Applicant: Ricoh Company, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2015-168052 20150827
- Main IPC: G02B15/20
- IPC: G02B15/20 ; G02B13/16 ; G03B21/14 ; G02B17/00 ; G02B7/02 ; G02B17/08 ; G03B21/28

Abstract:
An optical system includes a reflective optical system on a magnification side along an optical path of the projection optical system and a refractive optical system on a reduction side along the optical path. The reflective optical system includes one reflective optical element having a power. The refractive optical system includes a front group on the magnification side and a rear group on the reduction side. The front group having, in order from the magnification side toward the reduction side, a first lens group with a positive or negative refractive power, a second lens group, and a third lens group with a positive refractive power. The rear group has a positive refractive power. The first lens group moves to the magnification side, and the second lens group and the third lens group move to the reduction side in a change in focus from a long distance to a short distance.
Public/Granted literature
- US20190170988A1 PROJECTION OPTICAL SYSTEM, PROJECTION APPARATUS, AND PROJECTION SYSTEM Public/Granted day:2019-06-06
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