Imprint apparatus and method of manufacturing semiconductor device
Abstract:
According to one embodiment, an imprint apparatus includes: an ejection unit that ejects droplets of a resin-based mask material on a substrate on the basis of a droplet dropping condition; and a control unit that selects a first droplet dropping condition according to a pattern to be transferred to the resin-based mask material and a second droplet dropping condition according to an underlying step difference amount that is concave-convex of a first shot area and causes the ejection unit to eject the droplets with respect to the first shot area, wherein the shot area where a pattern is formed on the substrate by one time of imprinting is set.
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