• Patent Title: Exposure apparatus and exposure method, and flat panel display manufacturing method
  • Application No.: US15763579
    Application Date: 2016-09-29
  • Publication No.: US10585355B2
    Publication Date: 2020-03-10
  • Inventor: Takachika Shimoyama
  • Applicant: NIKON CORPORATION
  • Applicant Address: JP Tokyo
  • Assignee: NIKON CORPORATION
  • Current Assignee: NIKON CORPORATION
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff PLC
  • Priority: JP2015-194828 20150930
  • International Application: PCT/JP2016/078809 WO 20160929
  • International Announcement: WO2017/057569 WO 20170406
  • Main IPC: G03F7/20
  • IPC: G03F7/20 G02F1/13
Exposure apparatus and exposure method, and flat panel display manufacturing method
Abstract:
A liquid crystal exposure apparatus has a measurement system having scales arranged apart from each other in the X-axis direction provided at a substrate stage holding a substrate and heads each irradiating the scales with a measurement beam; and a measurement device that measures positions of head units in the Y-axis direction. The measurement system measures a position of the substrate holder in directions of three degrees of freedom within a plane, based on measurement information of at least three heads. Each of the heads move off of one scale while the substrate holder is moved in the X-axis direction and moves to irradiate another scale adjacent to the one scale, and correction information to control movement of the substrate holder using the head moving to irradiate another scale is acquired, based on measurements of at least three heads.
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