Invention Grant
- Patent Title: Reference-image confirmation method, mask inspection method, and mask inspection device
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Application No.: US15723948Application Date: 2017-10-03
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Publication No.: US10586323B2Publication Date: 2020-03-10
- Inventor: Eiji Matsumoto , Manabu Isobe
- Applicant: NUFLARE TECHNOLOGY, INC.
- Applicant Address: JP Yokohama-shi
- Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-199435 20161007
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G03F1/84 ; G03F1/36 ; G06F16/583

Abstract:
To include generating a reference image based on a comparison between design data of a mask having patterns and an optical image of the mask in a first region of the mask designated in advance, and confirming whether the generated reference image has effectiveness, the generating and the confirming being performed by a reference circuit, in which the confirmation on whether the reference image has effectiveness includes adding, as a confirmation region in which whether the reference image has effectiveness is to be confirmed, a second region of the mask in addition to the first region set in advance as the confirmation region, the adding being performed by an addition circuit, and confirming whether the reference image has effectiveness in the confirmation region including the first region and the second region, the confirming being performed by the reference circuit.
Public/Granted literature
- US20180101941A1 REFERENCE-IMAGE CONFIRMATION METHOD, MASK INSPECTION METHOD, AND MASK INSPECTION DEVICE Public/Granted day:2018-04-12
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