Invention Grant
- Patent Title: Side shield formation
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Application No.: US16216419Application Date: 2018-12-11
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Publication No.: US10586559B1Publication Date: 2020-03-10
- Inventor: Jia Sun , Dong Lin , Shen Zhe , Jianhua Xue , Wei Tian , Joe Mundenar
- Applicant: Seagate Technology LLC
- Applicant Address: US CA Cupertino
- Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee Address: US CA Cupertino
- Agency: Westman, Champlin & Koehler, P.A.
- Main IPC: G11B5/31
- IPC: G11B5/31 ; G11B5/11 ; G11B5/115

Abstract:
A method includes forming a write pole layer having a front surface, a leading surface, a trailing surface and side surfaces connecting the leading surface to the trailing surface. The method also includes forming side shield layers proximate to the side surfaces of the write pole layer. A patterned sacrificial layer is deposited over the side shield layers, and a trailing surface bevel is formed on the write pole layer.
Information query
IPC分类: