Invention Grant
- Patent Title: Method of manufacture of a multilayer structure
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Application No.: US16270015Application Date: 2019-02-07
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Publication No.: US10586651B2Publication Date: 2020-03-10
- Inventor: Armin Goelzhaeuser , Andre' Beyer , Paul Penner , Xianghui Zhang
- Applicant: CNM Technologies GmbH
- Applicant Address: DE Bielefeld
- Assignee: CNM TECHNOLOGIES GMBH
- Current Assignee: CNM TECHNOLOGIES GMBH
- Current Assignee Address: DE Bielefeld
- Agency: 24IP Law Group USA, PLLC
- Agent Timothy R DeWitt
- Priority: GB1411334.4 20140626
- Main IPC: H01G4/008
- IPC: H01G4/008 ; C01B32/186 ; G03F7/20 ; H01G4/08 ; H01G4/228 ; B32B9/00 ; G03F7/16 ; G03F7/26 ; B82Y40/00 ; B82Y30/00

Abstract:
Disclosed is a method for the manufacture of a multilayer structure comprising a first layer, a second layer and a third layer for example to form a capacitor. The multilayer structure comprises a first layer, a second layer and a third layer, wherein the first layer and the third layer each form at least one of at least two electrodes and comprise one or more pyrolyzed carbon nanomembranes or one or more layers of graphene, and the second layer is a dielectric comprising one or more carbon nanomembranes.
Public/Granted literature
- US20190228910A1 Method of Manufacture of a Multilayer Structure Public/Granted day:2019-07-25
Information query