Invention Grant
- Patent Title: Semiconductor device and method of manufacture
-
Application No.: US15966558Application Date: 2018-04-30
-
Publication No.: US10586763B2Publication Date: 2020-03-10
- Inventor: Hsien-Ju Tsou , Chih-Wei Wu , Jing-Cheng Lin , Pu Wang , Szu-Wei Lu , Ying-Ching Shih
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L23/538 ; H01L23/00 ; H01L21/768 ; H01L25/00 ; H01L25/10 ; H01L25/065

Abstract:
An integrated fan out package on package architecture is utilized along with de-wetting structures in order to reduce or eliminated delamination from through vias. In embodiments the de-wetting structures are titanium rings formed by applying a first seed layer and a second seed layer in order to help manufacture the vias. The first seed layer is then patterned into a ring structure which also exposes at least a portion of the first seed layer.
Public/Granted literature
- US20190148288A1 Semiconductor Device and Method of Manufacture Public/Granted day:2019-05-16
Information query
IPC分类: