Invention Grant
- Patent Title: Light emitting element and electron beam deposition apparatus for manufacturing same
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Application No.: US15540701Application Date: 2015-12-30
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Publication No.: US10586828B2Publication Date: 2020-03-10
- Inventor: Su Hyoung Son , Keon Hwa Lee , Byeong Kyun Choi , Kwang Ki Choi
- Applicant: LG INNOTEK CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD.
- Current Assignee: LG INNOTEK CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2015-0009753 20150121
- International Application: PCT/KR2015/014455 WO 20151230
- International Announcement: WO2016/117845 WO 20160728
- Main IPC: H01L33/46
- IPC: H01L33/46 ; H01L27/15 ; H01L33/38 ; H01L23/00 ; H01L33/00 ; H01L33/06 ; H01L33/10 ; H01L33/20 ; H01L33/30 ; H01L33/40 ; H01L33/42 ; H01L33/44 ; H01L33/62 ; H01L21/67

Abstract:
A light emitting element of an embodiment may comprise: a light emitting structure including a first conductive type semiconductor layer, an active layer, and a second conductive type semiconductor layer, and first and second electrodes placed on the first and second conductive semiconductor layers respectively, wherein the light emitting structure includes a first mesa region, the first conductive type semiconductor layer includes a second mesa region, and the first electrode includes: a first region which is a partial region of the upper surface of the second mesa region; a second region which is the side surface of the second mesa region; and a third region arranged to extend from the edge of the side surface of the second mesa region, wherein the first, second, and third regions are formed such that the thickness of the first region (d1), the second region (d2), and the third region (d3) have a ratio of d1:d2:d3=1:0.9˜1.1:1.
Public/Granted literature
- US20180090539A1 LIGHT EMITTING ELEMENT AND ELECTRON BEAM DEPOSITION APPARATUS FOR MANUFACTURING SAME Public/Granted day:2018-03-29
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