Invention Grant
- Patent Title: Solar cell manufacturing method
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Application No.: US15743099Application Date: 2015-10-21
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Publication No.: US10586880B2Publication Date: 2020-03-10
- Inventor: Hiroaki Morikawa , Hirohisa Nishino , Yukiko Nakazawa , Atsuro Hama , Yuichiro Hosokawa
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Chiyoda-Ku, Tokyo
- Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee Address: JP Chiyoda-Ku, Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- International Application: PCT/JP2015/079744 WO 20151021
- International Announcement: WO2017/068671 WO 20170427
- Main IPC: H01L27/30
- IPC: H01L27/30 ; H01L31/0216 ; H01L21/66 ; H01L31/18 ; G01N21/88 ; H01L31/0224 ; H01L31/068

Abstract:
A solar cell manufacturing method includes a step of forming a diffusion layer including a first section and a second section on a light-receiving side of a semiconductor substrate, where the first section has a first concentration of impurities, and the second section has a second concentration of the impurities that is higher than the first concentration, a step of irradiating the diffusion layer with detection light that is reflected at a higher reflectivity on the first section than on the second section, and a step of detecting the first section that corresponds to a first reflectivity, and the second section that corresponds to a second reflectivity that is lower than the first reflectivity in the diffusion layer on the basis of a difference in reflectivity of the detection light reflected off the respective sections of the diffusion layer.
Public/Granted literature
- US20190081188A1 SOLAR CELL MANUFACTURING METHOD Public/Granted day:2019-03-14
Information query
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