Invention Grant
- Patent Title: Electronic device and method for fabricating the same
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Application No.: US16203114Application Date: 2018-11-28
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Publication No.: US10586917B2Publication Date: 2020-03-10
- Inventor: Jong-Koo Lim , Won-Joon Choi , Guk-Cheon Kim , Yang-Kon Kim , Ku-Youl Jung , Toshihiko Nagase , Youngmin Eeh , Daisuke Watanabe , Kazuya Sawada , Makoto Nagamine
- Applicant: SK hynix Inc. , TOSHIBA MEMORY CORPORATION
- Applicant Address: KR Gyeonggi-do JP Tokyo
- Assignee: SK hynix Inc.,TOSHIBA MEMORY CORPORATION
- Current Assignee: SK hynix Inc.,TOSHIBA MEMORY CORPORATION
- Current Assignee Address: KR Gyeonggi-do JP Tokyo
- Agency: IP & T Group LLP
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L43/10 ; H01L43/12

Abstract:
Provided is a method for fabricating an electronic device including a variable resistance element which includes a free layer formed over a substrate and having a changeable magnetization direction, a pinned layer having a pinned magnetization direction, a tunnel barrier layer interposed between the free layer and the pinned layer, and a magnetic correction layer suitable for reducing the influence of a stray field generated by the pinned layer. The method may include: cooling the substrate; and forming the magnetic correction layer over the cooled substrate.
Public/Granted literature
- US20190109280A1 ELECTRONIC DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2019-04-11
Information query
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