Invention Grant
- Patent Title: Solvent-resistant hole transport layers
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Application No.: US15101133Application Date: 2014-12-09
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Publication No.: US10586929B2Publication Date: 2020-03-10
- Inventor: Nora Sabina Radu , Adam Fennimore
- Applicant: LG Chem, Ltd.
- Applicant Address: KR
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- International Application: PCT/US2014/069273 WO 20141209
- International Announcement: WO2015/089027 WO 20150618
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C07D327/06 ; C08G61/10 ; C08G73/02 ; C07D333/72 ; C08G61/12 ; H01L51/50 ; H01L51/56

Abstract:
There is provided a hole transport material having Formula I, Formula Ia, or Formula II: In the formulae: A is an aromatic moiety including at least one triarylamino group; B′ is an aromatic moiety; E is an end group which is H, D, alkyl, aryl, halide, deuterated alkyl, or deuterated aryl; G is G1, G2, or a deuterated analog thereof where the asterisk represents the point of attachment; n is an integer greater than 0; and m1 and m2 represent non-zero mole fractions, such that m1+m2=1.
Public/Granted literature
- US20160308141A1 SOLVENT-RESISTANT HOLE TRANSPORT LAYERS Public/Granted day:2016-10-20
Information query
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